X-Ray Reflectivity of chips for quantum application

DOI

We will be measuring X-ray reflectivity of various samples that have quantum applications. These sample consist of stacked films with different thickness on Si substrate. We will be using new lenses of ID31 to achieve submicron beamsize. With this capability, we hope to determine the precise thickness and more importantly, the roughness of the different interfaces. Obtaining insights of these interfaces is crucial for the quantum chips industry.

Identifier
DOI https://doi.org/10.15151/ESRF-ES-1162136801
Metadata Access https://icatplus.esrf.fr/oaipmh/request?verb=GetRecord&metadataPrefix=oai_datacite&identifier=oai:icatplus.esrf.fr:inv/1162136801
Provenance
Creator Jakub DRNEC ORCID logo; Veijo HONKIMAKI; Andrea SARTORI ORCID logo
Publisher ESRF (European Synchrotron Radiation Facility)
Publication Year 2026
Rights CC-BY-4.0; https://creativecommons.org/licenses/by/4.0
OpenAccess true
Representation
Resource Type Data from large facility measurement; Collection
Discipline Particles, Nuclei and Fields