Imaging dynamics of plastic relaxation of InGaN films under thermal annealing.

DOI

(In,Ga)N alloy is a key material system for applications in optoelectronics and photovoltaics. Despite more than 20 years of research, a remaining central problem is the achievable In concentration in films grown with a high structural quality on GaN. One approach towards higher In concentrations is to reduce the lattice mismatch via growth on plastically relaxed InGaN buffers. In this project, we plan to study the dynamics of plastic relaxation in InGaN buffers by in-situ X-ray diffraction microscopy during annealing. This way, we aim to understand the peculiar dislocation patterns occurring in relaxed InGaN on GaN.

Identifier
DOI https://doi.org/10.15151/ESRF-ES-969291466
Metadata Access https://icatplus.esrf.fr/oaipmh/request?verb=GetRecord&metadataPrefix=oai_datacite&identifier=oai:icatplus.esrf.fr:inv/969291466
Provenance
Creator Carsten RICHTER (ORCID: 0000-0002-4230-215X); Joanna MONETA ORCID logo; Tobias SCHULLI; Julita SMALC-KOZIOROWSKA ORCID logo; Robert KERNKE; Tadesse Billo RETA ORCID logo; Tobias SCHULZ ORCID logo
Publisher ESRF (European Synchrotron Radiation Facility)
Publication Year 2025
Rights CC-BY-4.0; https://creativecommons.org/licenses/by/4.0
OpenAccess true
Representation
Resource Type Data from large facility measurement; Collection
Discipline Particles, Nuclei and Fields